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| 內容簡介： |
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《硅加工中的表征》是材料表征原版系列丛书之一。全书共分六章，内容包括：材料表征技术在硅外延生长中的应用；多晶硅导体；硅化物；铝和铜基导线；级钨基导体；阻隔性薄膜。本书适合作为相关领域的教学、研究、技术人员以及研究生和高年级本科生的参考书。
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| 目錄：
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Preface to the Reissue of the Materials Characterization Series
Preface to Series
Preface to the Reissue of Characterization in Silicon Processing
Preface
Contributors
APPLICATION OF MATERIALS CHARACTERIZATION TECHNIQUES TO SILICON EPITAXIAL GROWTH
1.1 Introduction
1.2 Silicon Epitaxial Growth
1.3 Film and Process Characterization
1.4 Selective Growth
1.5 Si1_xGex Epitaxial Growth
1.6 Si1_ xGex Material Characterization
1.7 Summary
POLYSILICON CONDUCTORS
2.1 Introduction
2.2 Deposition
2.3 Doping
2.4 Patterning
2.5 Subsequent Processing
SILICIDES
3.1 Introduction
3.2 Formation of Silicides
3.3 The Silicide-Silicon Interface
3.4 Oxidation of Silicides
3.5 Dopant Redistribution During Silicide Formation
3.6 Stress in Silicides
3.7 Stability of Silicides
3.8 Summary
ALUMINUM- AND COPPER-BASED CONDUCTORS
4.1 Introduction
4.2 Film Deposition
4.3 Film Growth
4.4 Encapsulation
4.5 Reliability Concerns
TUNGSTEN-BASED CONDUCTORS
5.1 Applications for ULSI Processing
5.2 Deposition Principles
5.3 Blanket Tungsten Deposition
5.4 Selective Tungsten Deposition
BARRIER FILMS
6.1 Introduction
6.2 Characteristics of Barrier Films
6.3 Types of Barrier Films
6.4 Processing Barrier Films
6.5 Examples of Barrier Films
6.6 Summary
APPENDIX: TECHNIQUE SUMMARIES
1 Auger Electron Spectroscopy AES
2 Ballistic Electron Emission Microscopy BEEM
3 Capacitance-Voltage C-V Measurements
4 Deep Level Transient Spectroscopy DLTS
5 Dynamic Secondary Ion Mass Spectrometry Dynamic SIMS
6 Electron Beam Induced Current EBIC Microscopy
7 Energy-Dispersive X-Ray Spectroscopy EDS
8 Focused Ion Beams FIBs
9 Fourier Transform Infrared Spectroscopy FTIR
10 Hall Effect Resistivity Measurements
11 Inductively Coupled Plasma Mass Spectrometry ICPMS
12 Light Microscopy
13 Low-Energy Electron Diffraction LEED
14 Neutron Activation Analysis NAA
15 Optical Scatterometry
16 Photoluminescence PL
17 Raman Spectroscopy
18 Reflection High-Energy Electron Diffraction RHEED
19 Rutherford Backscattering Spectrometry RBS
20 Scanning Electron Microscopy SEM
21 Scanning Transmission Electron Microscopy STEM
22 Scanning Tunneling Microscopy and Scanning Force Microscopy STM and SFM
23 Sheet Resistance and the Four Point Probe
24 Spreading Resistance Analysis SRA
25 Static Secondary Ion Mass Spectrometry Static SIMS
26 Surface Roughness: Measurement, Formation by Sputtering, Impact on Depth Profiling
27 Total Reflection X-Ray Fluorescence Analysis TXRF
28 Transmission Electron Microscopy TEM
29 Variable-Angle Spectroscopic Ellipsometry VASE
30 X-Ray Diffraction XRD
31 X-Ray Fluorescence XRF
32 X-Ray Photoelectron Spectroscopy XPS
Index
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